US PATENT SUBCLASS 438 / 485
.~.~ Deposition utilizing plasma (e.g., glow discharge, etc.)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

478  DF  FORMATION OF SEMICONDUCTIVE ACTIVE REGION ON ANY SUBSTRATE (E.G., FLUID GROWTH, DEPOSITION) {9}
482  DF  .~ Amorphous semiconductor {4}
485.~.~ Deposition utilizing plasma (e.g., glow discharge, etc.)

DEFINITION

Classification: 438/485

Deposition utilizing plasma (e.g., glow discharge, etc.):

(under subclass 482) Process utilizing a plasma or glow discharge during the deposition of the semiconductive material.