438 / | HD | SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS |
400 | DF | FORMATION OF ELECTRICALLY ISOLATED LATERAL SEMICONDUCTIVE STRUCTURE {10} |
424 | DF | .~ Grooved and refilled with deposited dielectric material {7} |
425 | DF | .~.~ Combined with formation of recessed oxide by localized oxidation {1} |
426 | .~.~.~ Recessed oxide laterally extending from groove |