US PATENT SUBCLASS 430 / 170
.~.~ Radiation-sensitive composition


Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

141  DF  DIAZO REPRODUCTION, PROCESS, COMPOSITION, OR PRODUCT {7}
154  DF  .~ Composition or product which contains radiation sensitive compound having moiety of nitrogen double or triple bonded directly to nitrogen other than chromophore moiety, e.g., triazene containing product, etc., process of making, and composition or product used to finish or develop a diazo reproduction {3}
170.~.~ Radiation-sensitive composition {4}
171  DF  .~.~.~> Diazonium compound containing {9}
188  DF  .~.~.~> Diazo-N-sulfonate containing
189  DF  .~.~.~> Quinone diazide containing {4}
194  DF  .~.~.~> Azide containing {3}


DEFINITION

Classification: 430/170

Radiation-sensitive composition:

(under subclass 154) Compositions which are sensitive to radiation.

SEE OR SEARCH THIS CLASS, SUBCLASS:

914, for diazo compounds functioning as cationic or anionic initiators in radiation activated polymer forming reactions.

919, and 920, for diazo compound functioning as free-radical initiators in radiation activated polymer forming reactions.

927, for diazo compounds functioning as cross-linking agents in radiation activated polymer forming and modifying reactions.