US PATENT SUBCLASS 430 / 171
.~.~.~ Diazonium compound containing


Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

141  DF  DIAZO REPRODUCTION, PROCESS, COMPOSITION, OR PRODUCT {7}
154  DF  .~ Composition or product which contains radiation sensitive compound having moiety of nitrogen double or triple bonded directly to nitrogen other than chromophore moiety, e.g., triazene containing product, etc., process of making, and composition or product used to finish or develop a diazo reproduction {3}
170  DF  .~.~ Radiation-sensitive composition {4}
171.~.~.~ Diazonium compound containing {9}
172  DF  .~.~.~.~> At least two diverse diazonium compounds
173  DF  .~.~.~.~> At least two couplers {1}
175  DF  .~.~.~.~> Polymeric diazonium compound
176  DF  .~.~.~.~> Polymeric mixture
177  DF  .~.~.~.~> Processing ingredient other than coupler or carboxylic acid compound {2}
180  DF  .~.~.~.~> Naphthol coupler included
181  DF  .~.~.~.~> Phenol coupler included
182  DF  .~.~.~.~> Aceto-aceto or heterocyclic coupler included
183  DF  .~.~.~.~> P-amino or p-thio benzene diazonium compound {4}


DEFINITION

Classification: 430/171

Diazonium compound containing:

(under subclass 170) Compositions wherein the radiation-sensitive diazo compound is a diazonium compound or salt.