US PATENT SUBCLASS 430 / 154
.~ Composition or product which contains radiation sensitive compound having moiety of nitrogen double or triple bonded directly to nitrogen other than chromophore moiety, e.g., triazene containing product, etc., process of making, and composition or product used to finish or develop a diazo reproduction

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

141  DF  DIAZO REPRODUCTION, PROCESS, COMPOSITION, OR PRODUCT {7}
154.~ Composition or product which contains radiation sensitive compound having moiety of nitrogen double or triple bonded directly to nitrogen other than chromophore moiety, e.g., triazene containing product, etc., process of making, and composition or product used to finish or develop a diazo reproduction {3}
155  DF  .~.~> Product with at least two named layers {5}
168  DF  .~.~> Process of making diazo product {1}
170  DF  .~.~> Radiation-sensitive composition {4}

DEFINITION

Classification: 430/154

Composition or product which contains radiation sensitive compound having moiety of nitrogen double or triple bonded directly to nitrogen other than chromophore moiety, e.g., triazene containing product, etc., process of making, and composition or product used to finish or develop a diazo reproduction:

(under subclass 141) Compositions or products having a radiation-sensitive diazo compound, and processes of making same and composition or product used to finish or develop a diazo reproduction.