US PATENT SUBCLASS 430 / 141
DIAZO REPRODUCTION, PROCESS, COMPOSITION, OR PRODUCT

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

141DIAZO REPRODUCTION, PROCESS, COMPOSITION, OR PRODUCT {7}
142  DF  .~> Process producing multiple image {1}
144  DF  .~> Powder development of tacky surface
145  DF  .~> Photomechanical dye image prepared
146  DF  .~> Diazo-type process, i.e., producing dye image by reacting the diazo or the imaged reaction product of the diazo {5}
152  DF  .~> Vesicular process
153  DF  .~> Physical development
154  DF  .~> Composition or product which contains radiation sensitive compound having moiety of nitrogen double or triple bonded directly to nitrogen other than chromophore moiety, e.g., triazene containing product, etc., process of making, and composition or product used to finish or develop a diazo reproduction {3}

DEFINITION

Classification: 430/141

DIAZO REPRODUCTION, PROCESS, COMPOSITION, OR PRODUCT:

(under the class definition) Compositions and products having a radiation-sensitive diazo compound, i.e., a compound having at least two directly attached nitrogen atoms which are attached by double or triple bonds other than a chromophore group, e.g., diazonium, azide, quinone diazide, diazo sulfonate, or triazene compound, etc.; process wherein the radiation-sensitive diazo compound on or in a medium is imaged with radiation to produce a visible image being developed to produce a visible image of an original; process wherein the visible or latent image is not formed by the action of radiation is finished or perfected as by development, fixing, or transferring; process of making the composition and product, finishing or perfecting process such as development, or composition or product used in the finishing or perfecting process.

(1) Note. When the claimed radiation- sensitive compounds is defined functionally such as "light-decomposable agent", and all the identified radiation-sensitive compound in the claimed disclosure are diazo compounds, the patent is classified in this subclass or indented subclass.

SEE OR SEARCH THIS CLASS, SUBCLASS:

269, for processes of using radiation-sensitive diazo material for nonvisible image formation wherein imaging affects physical property of the material.

302, especially, for making lithos:graphic printing plates.

322, for forming a relief image.