US PATENT SUBCLASS 430 / 189
.~.~.~ Quinone diazide containing

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

141  DF  DIAZO REPRODUCTION, PROCESS, COMPOSITION, OR PRODUCT {7}
154  DF  .~ Composition or product which contains radiation sensitive compound having moiety of nitrogen double or triple bonded directly to nitrogen other than chromophore moiety, e.g., triazene containing product, etc., process of making, and composition or product used to finish or develop a diazo reproduction {3}
170  DF  .~.~ Radiation-sensitive composition {4}
189.~.~.~ Quinone diazide containing {4}
190  DF  .~.~.~.~> Polymeric quinone diazide
191  DF  .~.~.~.~> And monomeric processing ingredient
192  DF  .~.~.~.~> Polymeric mixture
193  DF  .~.~.~.~> O-quinone diazide

DEFINITION

Classification: 430/189

Quinone diazide containing:

(under subclass 170) Compositions wherein the radiation-sensitive diazo compound is a quinone diazide compound.

(1) Note. See subclass 165 for the definition of quinone diazides for the purposes of this class.