US PATENT SUBCLASS 216 / 66
.~.~ Using ion beam, ultraviolet, or visible light

Current as of: June, 1999
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216 /   HD   ETCHING A SUBSTRATE: PROCESSES

58  DF  GAS PHASE ETCHING OF SUBSTRATE {6}
63  DF  .~ Application of energy to the gaseous etchant or to the substrate being etched {4}
66.~.~ Using ion beam, ultraviolet, or visible light

DEFINITION

Classification: 216/66

Using ion beam, ultraviolet, or visible light:

(under subclass 63) Process wherein the energy source is an ion beam, ultraviolet, or visible light.