US PATENT SUBCLASS 216 / 50
.~.~ Mask resist contains a color imparting agent

Current as of: June, 1999
Click HD for Main Headings
Click for All Classes

Internet Version by PATENTEC © 1999      Terms of Use


216 /   HD   ETCHING A SUBSTRATE: PROCESSES

41  DF  MASKING OF A SUBSTRATE USING MATERIAL RESISTANT TO AN ETCHANT (I.E., ETCH RESIST) {9}
49  DF  .~ Mask resist contains organic compound {1}
50.~.~ Mask resist contains a color imparting agent

DEFINITION

Classification: 216/50

Mask resist contains a color imparting agent:

(under subclass 49) Process wherein the organic resist further contains a material expressly added for imparting color to the resist.