US PATENT SUBCLASS 216 / 49
.~ Mask resist contains organic compound

Current as of: June, 1999
Click HD for Main Headings
Click for All Classes

Internet Version by PATENTEC © 1999      Terms of Use


216 /   HD   ETCHING A SUBSTRATE: PROCESSES

41  DF  MASKING OF A SUBSTRATE USING MATERIAL RESISTANT TO AN ETCHANT (I.E., ETCH RESIST) {9}
49.~ Mask resist contains organic compound {1}
50  DF  .~.~> Mask resist contains a color imparting agent

DEFINITION

Classification: 216/49

Mask resist contains organic compound:

(under subclass 41) Process wherein the resist material contains an organic compound.

(1) Note. See Glossary for a definition of the term Organic.

(2) Note. See subclass 41 for masking material where the patent disclosure is silent as to its chemical nature.