 Electronic File Wrappers |  Electronic Patent Documents |  Paper Patent Documents | Current as of: June, 1999
|  and Services |
| DF | CLASS NOTES | |
| * | DD | SYNTHETIC RESINS (Class 520, Subclass 1) |
| 1 | DF | .~ COMPOSITIONS TO BE POLYMERIZED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR COMPOSITIONS TO BE MODIFIED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR PROCESSES OF PREPARING OR TREATING A SOLID POLYMER UTILIZING WAVE ENERGY |
| 2 | DF | .~.~ Processes of forming or modifying a solid polymer by laser; or compositions therefore |
| 3 | DF | .~.~ Processes of forming or modifying a solid polymer wherein specified mixing, stirring, agitating, movement of material or directional orientation is employed; or compositions therefore |
| 4 | DF | .~.~ Processes of forming or modifying a solid polymer by wave energy wherein at least two distinct external radiant energy sources are utilized; or compositions therefore |
| 5 | DF | .~.~ Processes of forming or modifying a solid polymer by wave energy wherein a temperature less than 0 degree C (32 degree F) or greater than 250 degree C (482 degree F) is employed; or compositions therefore |
| 6 | DF | .~.~ Compositions to be polymerized or modified by wave energy wherein said composition contains at least one specified rate-affecting material; or processes of preparing or treating a solid polymer utilizing wave energy in the presence of at least one specified rate-affecting material; e.g., nitrogen containing photosensitizer, oxygen containing photoinitiator, etc. wave energy in order to prepare a cellular product |
| 7 | DF | .~.~.~ Contains two or more rate-affecting materials, at least one of which is specified |
| 8 | DF | .~.~.~.~ At least two specified rate-affecting materials containing keto group not part of a ring; or contains a nonspecified photoinitiator or photosensitizer and specified ketone containing material wherein the keto group is not part of a ring |
| 9 | DF | .~.~.~.~.~ With a heterocyclic specified rate-affecting material |
| 10 | DF | .~.~.~.~.~ With a tertiary amine specified rate-affecting material |
| 11 | DF | .~.~.~.~ Contains compound containing keto group not part of a ring and nonspecified rate-affecting material other than mere photoinitiator or photosensitizer |
| 12 | DF | .~.~.~.~ Contains compound containing keto group not part of a ring and a specified rate-affecting material; or contains a specified rate-affecting material and a nonspecified photoinitiator or photosensitizer |
| 13 | DF | .~.~.~.~.~ Specified rate-affecting material is a peroxide or azo compound |
| 14 | DF | .~.~.~.~.~ Specified rate-affecting material is an amide or tertiary amine |
| 15 | DF | .~.~.~.~.~ Specified rate-affecting material contains onium group |
| 16 | DF | .~.~.~.~.~ Specified rate-affecting material is heterocyclic |
| 17 | DF | .~.~.~.~.~ Specified rate-affecting material contains sulfur |
| 18 | DF | .~.~.~.~.~ Specified rate-affecting material contains phosphorous, arsenic, antimony or nitrogen atom |
| 19 | DF | .~.~.~.~.~ Specified rate-affecting material is an aldehyde or aldehyde derivative |
| 20 | DF | .~.~.~.~.~ Specified rate-affecting material is a carboxylic acid or derivative |
| 21 | DF | .~.~.~.~.~ Specified rate-affecting material contains C-OH or C-O-C group |
| 22 | DF | .~.~.~.~.~ Specified rate-affecting material contains an inorganic compound |
| 23 | DF | .~.~.~.~.~ Specified rate-affecting material contains only carbon, hydrogen, or halogen and at least one atom of carbon is bonded to hydrogen or a halogen atom |
| 24 | DF | .~.~.~.~ Specified rate-affecting material is a peroxide |
| 25 | DF | .~.~.~.~ Specified rate-affecting material contains onium group |
| 26 | DF | .~.~.~.~ Specified rate-affecting material is heterocyclic |
| 27 | DF | .~.~.~.~ Specified rate-affecting material contains sulfur |
| 28 | DF | .~.~.~.~ Specified rate-affecting material contains phosphorous, arsenic, antimony or nitrogen |
| 29 | DF | .~.~.~.~ Specified rate-affecting material is a metal-containing organic compound |
| 30 | DF | .~.~.~.~ Specified rate-affecting material is organic |
| 31 | DF | .~.~.~ Specified rate-affecting material contains onium group |
| 32 | DF | .~.~.~.~ Diazonium containing material |
| 33 | DF | .~.~.~ Specified rate-affecting material contains a ketone group -c-(CO)n-c-, the (CO)n not being part of a ring |
| 34 | DF | .~.~.~.~ Containing ethylenic unsaturation |
| 35 | DF | .~.~.~.~ Contained in polymeric rate-affecting material, e.g., synthetic resin, etc. |
| 36 | DF | .~.~.~.~ Containing two or more ketone groups |
| 37 | DF | .~.~.~.~.~ Adjacent (C=O)* groups where * is at least two |
| 38 | DF | .~.~.~.~ Containing phosphorous |
| 39 | DF | .~.~.~.~ Containing nitrogen |
| 40 | DF | .~.~.~.~ Containing C-CO-CHOH, e.g., benzoin, etc. |
| 41 | DF | .~.~.~.~.~ Containing C-CO-CHOH-CHOR wherein R is organic |
| 42 | DF | .~.~.~.~ Containing C-CO-C(R)(OH) wherein R is organic |
| 43 | DF | .~.~.~.~ Containing C-CO-C(H)(OR) wherein R is organic, e.g., benzoin methyl ether, etc. |
| 44 | DF | .~.~.~.~ Containing C-CO-C(R)(OR) wherein R is organic, e.g., diethoxyacetophenone, etc. |
| 45 | DF | .~.~.~.~ Containing halogen, e.g., chloroacetone, etc. |
| 46 | DF | .~.~.~.~ At least two aryl groups connected directly to same carbonyl carbon, e.g., benzophenone, etc. |
| 47 | DF | .~.~.~ Specified rate-affecting material is a quinone |
| 48 | DF | .~.~.~.~ Quinone ring is part of polynuclear system, e.g., anthraquinone, etc. |
| 49 | DF | .~.~.~ Specified rate-affecting material contains chalcogen other than as oxygen |
| 50 | DF | .~.~.~.~ Hetero nitrogen ring |
| 51 | DF | .~.~.~.~.~ Containing mercapto or mercaptide group, e.g., (thio)mercaptobenzoxazole, etc. |
| 52 | DF | .~.~.~.~.~ Containing halogen |
| 53 | DF | .~.~.~.~ Hetero sulfur ring |
| 54 | DF | .~.~.~.~ C-(S)*-C wherein * is at least two |
| 55 | DF | .~.~.~.~ Sulfide |
| 56 | DF | .~.~.~.~ Mercapto group attached directly to aromatic ring, e.g., thiophenol, etc. |
| 57 | DF | .~.~.~.~ Nitrogen containing compound |
| 58 | DF | .~.~.~.~ Sulfenate, e.g., R-O-S-R, etc. |
| 59 | DF | .~.~.~.~ (O=S=O), e.g., sulfuryl or sulfonyl containing, etc. |
| 60 | DF | .~.~.~ Specified rate-affecting material is a peroxide |
| 61 | DF | .~.~.~.~ Hydroperoxide |
| 62 | DF | .~.~.~ Specified rate-affecting material contains a C-N=N-C-group |
| 63 | DF | .~.~.~ Specified rate-affecting material contains nitrogen or oxygen atom in heterocyclic ring |
| 64 | DF | .~.~.~ Specified rate-affecting material contains phosphorous |
| 65 | DF | .~.~.~ Specified rate-affecting material contains nitrogen |
| 66 | DF | .~.~.~ Specified rate-affecting material contains metal atom |
| 67 | DF | .~.~.~ Specified rate-affecting material contains halogen |
| 68 | DF | .~.~.~ Specified rate-affecting material contains oxygen |
| 69 | DF | .~.~.~.~ Phenolic, e.g., hydroquinone, etc. |
| 70 | DF | .~.~.~ Specified rate-affecting material contains only carbon and hydrogen |
| 71 | DF | .~.~ Processes of preparing or treating a solid polymer by wave energy in the presence of a designated nonreactant material (DNRM); or compositions therefore |
| 72 | DF | .~.~.~ Carbohydrate or derivative DNRM |
| 73 | DF | .~.~.~ Coal, asphaltic, or bituminous material DNRM |
| 74 | DF | .~.~.~ Organic DNRM |
| 75 | DF | .~.~.~.~ Heterocyclic ring containing DNRM |
| 76 | DF | .~.~.~.~ Phosphorous containing DNRM |
| 77 | DF | .~.~.~.~ Silicon containing DNRM |
| 78 | DF | .~.~.~.~ Nitrogen containing DNRM |
| 79 | DF | .~.~.~.~ Oxygen containing DNRM |
| 80 | DF | .~.~.~.~ Carbon and hydrogen only containing DNRM |
| 81 | DF | .~.~.~ Heavy metal containing DNRM |
| 82 | DF | .~.~.~ Phosphorous or sulfur containing DNRM |
| 83 | DF | .~.~.~ Oxygen containing DNRM |
| 84 | DF | .~.~.~.~ Water |
| 85 | DF | .~.~.~.~.~ Reacting an ethylenic monomer in the presence of a solid polymer |
| 86 | DF | .~.~.~.~.~ Treating a solid polymer |
| 87 | DF | .~.~ Processes involving protein as reactant or as solid polymer; or compositions therefore |
| 88 | DF | .~.~ Processes involving carbohydrate as reactant or as solid polymer; or compositions therefore |
| 89 | DF | .~.~.~ Preparing a polymer from carbohydrate and ethylenic reactant |
| 90 | DF | .~.~ Processes involving a polyurethane having terminal ethylenic unsaturation as reactant or as solid polymer; or compositions therefore |
| 91 | DF | .~.~.~ With a polysiloxane reactant or polymer |
| 92 | DF | .~.~.~ With a reactant containing ethylenic unsaturation derived from poly 1,2 epoxide or polymer |
| 93 | DF | .~.~.~ With polycarboxylic acid or derivative and a polyol, a condensate or solid polymer thereof reactant |
| 94 | DF | .~.~.~ With aldehyde or aldehyde derivative reactant, condensate or solid polymer thereof |
| 95 | DF | .~.~.~ With solid polymer derived solely from ethylenic monomers |
| 96 | DF | .~.~.~ With ethylenic reactant |
| 97 | DF | .~.~.~ Polyurethane has an oxygen other than as part of a urethane or carboxylic acid ester group |
| 98 | DF | .~.~.~ Polyurethane has at least one non-terminal ethylenic group |
| 99 | DF | .~.~ Processes involving a polysiloxane having ethylenic unsaturation as reactant or as solid polymer; or compositions therefore |
| 100 | DF | .~.~ Processes involving an ethylenically unsaturated material derived from poly 1,2-epoxide as reactant or a solid polymer; or compositions thereof |
| 101 | DF | .~.~.~ With polycarboxylic acid or derivative and a polyol, condensate or solid polymer thereof |
| 102 | DF | .~.~.~ With solid polymer derived solely from ethylencally unsaturated monomers |
| 103 | DF | .~.~.~ With ethylenic reactant |
| 104 | DF | .~.~ Processes involving an ethylenically unsaturated polyester derived from a polycarboxylic acid or derivative and polyol, condensate or solid polymer thereof; or compositions therefore |
| 105 | DF | .~.~.~ With aldehyde or aldehyde derivative reactant or polymer thereof |
| 106 | DF | .~.~.~ With solid polymer derived from ethylenically unsaturated monomers only |
| 107 | DF | .~.~.~ With ethylenic reactant |
| 108 | DF | .~.~.~ Condensate or solid polymer contains oxygen other than as part of a carboxylic acid ester moiety |
| 109 | DF | .~.~ Processes of chemically modifying a blend of two or more solid polymers in the presence of a chemical reactant; or compositions therefore |
| 110 | DF | .~.~.~ At least one solid polymer derived from ethylenic monomers has at least two ethylenic groups |
| 111 | DF | .~.~ Processes of treating a blend of two or more solid polymers or reacting one solid polymer with another solid polymer; or compositions therefore |
| 112 | DF | .~.~.~ At least two solid polymers derived from ethylenic monomers only |
| 113 | DF | .~.~ Processes of chemically modifying a solid polymer derived only from ethylenically unsaturated monomers by treating polymer with a chemical reactant; or compositions therefore |
| 114 | DF | .~.~.~ Chemical reactant is ethylenically unsaturated |
| 115 | DF | .~.~.~.~ Phosphorus |
| 116 | DF | .~.~.~.~ Nitrogen |
| 117 | DF | .~.~.~.~.~ Chemical reactant has two or more ethylenic groups |
| 118 | DF | .~.~.~.~ Sulfur |
| 119 | DF | .~.~.~.~.~ Chemical reactant has two or more ethylenic groups |
| 120 | DF | .~.~.~.~ Oxygen |
| 121 | DF | .~.~.~.~.~ Chemical reactant has two or more ethylenic groups |
| 122 | DF | .~.~.~.~.~ Hetero oxygen |
| 123 | DF | .~.~.~.~.~ Contains C-OH group other than as part of a COO-moiety |
| 124 | DF | .~.~.~.~ Carbon, hydrogen and halogen or carbon and halogen only |
| 125 | DF | .~.~.~.~ Carbon and hyrogen only |
| 126 | DF | .~.~.~ Chemical reactant contains nitrogen |
| 127 | DF | .~.~.~ Chemical reactant contains sulfur |
| 128 | DF | .~.~.~.~ Elemental sulfur |
| 129 | DF | .~.~.~ Chemical reacant contains oxygen |
| 130 | DF | .~.~.~.~ Contains C=O moiety |
| 131 | DF | .~.~.~ Chemical reactant is elemental halogen |
| 132 | DF | .~.~.~.~ Solid polymer treated contains halogen |
| 133 | DF | .~.~.~.~ Solid polymer derived from single monomer |
| 134 | DF | .~.~ Processes of chemically modifying a solid polymer or SICP derived from at least one saturated monomer by treating solid polymer or SICP with a chemical reactant; or compositions therefor |
| 135 | DF | .~.~.~ Chemical reactant is ethylenically unsaturated |
| 136 | DF | .~.~.~.~ Nitrogen |
| 137 | DF | .~.~.~.~.~ Chemical reactant has two or more ethylenic groups |
| 138 | DF | .~.~.~.~.~ Hetero nitrogen |
| 139 | DF | .~.~.~.~.~ N-C=O containing |
| 140 | DF | .~.~.~.~.~.~ Two or more N-C=O groups |
| 141 | DF | .~.~.~.~ Chalcogen |
| 142 | DF | .~.~.~.~.~ Chemical reactant has two or more ethylenic groups |
| 143 | DF | .~.~.~.~.~ Hetero oxygen |
| 144 | DF | .~.~.~.~.~ Carboxylic acid or derivative |
| 145 | DF | .~.~.~.~ Chemical reactant has two or more ethylenic groups and contains only carbon and hydrogen |
| 146 | DF | .~.~.~ Chemical reactant contains chalcogen |
| 147 | DF | .~.~.~ Chemical reactant contains halogen |
| 148 | DF | .~.~ Processes of treating a solid polymer or SICP derived from silicon containing reactant; or compositions therefore |
| 149 | DF | .~.~ Processes of treating a reaction product of a solid polymer and ethylenic reactant; or compositions therefore e.g., graft- or graft-type polymer, etc. |
| 150 | DF | .~.~ Processes of treating a solid polymer derived from ethylenic monomers only; or compositions therefore |
| 151 | DF | .~.~.~ Solid polymer derived from nitrogen containing monomer |
| 152 | DF | .~.~.~.~ Nitrogen containing monomer contains oxygen |
| 153 | DF | .~.~.~ Solid polymer derived from carboxylic acid or derivative monomer |
| 154 | DF | .~.~.~.~ Oxygen other than as part of carboxylic acid or derivative moiety |
| 155 | DF | .~.~.~ Solid polymer derived from halogen containing monomer |
| 156 | DF | .~.~.~.~ Halogen is fluorine |
| 157 | DF | .~.~.~ Solid polymer derived from monomer containing only carbon and hydrogen |
| 158 | DF | .~.~.~.~ At least one reactant contains two or more ethylenic groups |
| 159 | DF | .~.~.~.~.~ Polyisoprene or natural rubber |
| 160 | DF | .~.~.~.~ Carbocyclic ring containing, e.g., styrene, etc. |
| 161 | DF | .~.~.~.~ Derived from ethylene |
| 162 | DF | .~.~ Processes of treating a solid polymer or SICP derived from at least one nonethylenic reactant or compositions therefore |
| 163 | DF | .~.~.~ Solid polymer or SICP derived from reactant having halo-C(=O)-halo,halo C(=O)-O, or -O-C(=O)-O-group |
| 164 | DF | .~.~.~ Solid polymer or SICP derived from polycarboxylic acid or derivative and organic amine or from organic amine salt of a polycarboxylic acid |
| 165 | DF | .~.~.~ Solid polymer or SICP derived from polycarboxylic acid or derivative and polyol |
| 166 | DF | .~.~.~ Solid polymer or SICP derived from at least one heterocyclic monomer or aldehyde or aldehyde derivative |
| 167 | DF | .~.~ Processes of preparing a solid polymer from heterocyclic nitrogen monomers; or compositions therefore, e.g., carbazole, etc. |
| 168 | DF | .~.~ Processes of preparing a solid polymer from a heterocyclic chalogen monomer; or compsitions therefore |
| 169 | DF | .~.~.~ Two or more hetero atoms in hetero ring at least one of which is oxygen |
| 170 | DF | .~.~.~ 1,2 epoxy |
| 171 | DF | .~.~ Processes of preparing a solid polymer from at least one phosphorous containing monomer; or compositions therefore |
| 172 | DF | .~.~ Processes of preparing a solid polymer from at least one silicon containing monomer; or compositions therefore |
| 173 | DF | .~.~ Processes of preparing a solid polymer from at least one nitrogen containing monomer; or compositions therefore |
| 174 | DF | .~.~.~ Nitrogen containing reactant contains a N-C=O or N-C=O moiety |
| 175 | DF | .~.~.~.~ Acrylamide or methacrylamide |
| 176 | DF | .~.~.~ Organic polyamine and polycarboxylic acid or derivative or from an organic amine salt of a polycarboxylic acid |
| 177 | DF | .~.~.~ Acrylonitrile or methacrylonitrile |
| 178 | DF | .~.~ Processes of preparing a solid polymer from at least one oxygen containing monomer; or compositions therefore |
| 179 | DF | .~.~.~ Polycarboxylic acid or derivative and polyol, or condensate thereof, e.g., dimethylterephthalate, etc. |
| 180 | DF | .~.~.~ Sulfur containing |
| 181 | DF | .~.~.~ Ether group |
| 182 | DF | .~.~.~ Carboxylic acid or derivative |
| 183 | DF | .~.~.~.~ Oxygen other than as part of a COO-group |
| 184 | DF | .~.~ Processes of preparing a solid polymer from ethylenic reactants only; or compositions therefore |
| 185 | DF | .~.~.~ Carbon, hydrogen and halogen only reactant contains at least three carbon atoms |
| 186 | DF | .~.~.~ At least one reactant contains two or more ethylenic groups |
| 187 | DF | .~.~.~ At least one reactant contains halogen |
| 188 | DF | .~.~.~ Derived from aromatic hydrocarbon |
| 189 | DF | .~.~.~ Derived from ethylene only |
| ****************************** | ||
| CROSS-REFERENCE ART COLLECTIONS | ||
| ****************************** | ||
| 901 | DF | DARK STORAGE STABILIZER |
| 902 | DF | AIR INHIBITION |
| 903 | DF | REMOVAL OF RESIDUAL MONOMER |
| 904 | DF | MONOMER OR POLYMER CONTAINS INITIATING GROUP |
| 905 | DF | .~ Benzophenone group |
| 906 | DF | PREPARING SHRINKABLE MATERIAL |
| 907 | DF | INVOLVING PRECURSOR OF AN ULTRAVIOLET ABSORBER, E.G., MONOBENZOATE, ETC. |
| 908 | DF | DENTAL UTILITY |
| 909 | DF | SOLVENTLESS INK |
| 910 | DF | TREATMENT THROUGH AN EXTERNAL FILTER OR MASK (NONPHOTOGRAGHIC PROCESS) |
| 911 | DF | SPECIFIED TREATMENT INVOLVING MEGARAD OR LESS |
| 912 | DF | .~ Polymer derived from ethylenic monomers only |
| 913 | DF | NUMERICALLY SPECIFIED DISTINCT WAVELENGTH |
| 914 | DF | .~ Wavelength of 200 nanometers or less |
| 915 | DF | INVOLVING INERT GAS, STEAM, NITROGEN GAS, OR CARBON DIOXIDE |