| 522 / | HD | SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES |
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| * | DD | SYNTHETIC RESINS (Class 520, Subclass 1) {1} |
| 1 | DF | .~ COMPOSITIONS TO BE POLYMERIZED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR COMPOSITIONS TO BE MODIFIED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR PROCESSES OF PREPARING OR TREATING A SOLID POLYMER UTILIZING WAVE ENERGY {27} |
| 6 | DF | .~.~ Compositions to be polymerized or modified by wave energy wherein said composition contains at least one specified rate-affecting material; or processes of preparing or treating a solid polymer utilizing wave energy in the presence of at least one specified rate-affecting material; e.g., nitrogen containing photosensitizer, oxygen containing photoinitiator, etc. wave energy in order to prepare a cellular product {14} |
| 33 |  | .~.~.~ Specified rate-affecting material contains a ketone group -c-(CO)n-c-, the (CO)n not being part of a ring {11} |
| 34 | DF | .~.~.~.~> Containing ethylenic unsaturation |
| 35 | DF | .~.~.~.~> Contained in polymeric rate-affecting material, e.g., synthetic resin, etc. |
| 36 | DF | .~.~.~.~> Containing two or more ketone groups {1} |
| 38 | DF | .~.~.~.~> Containing phosphorous |
| 39 | DF | .~.~.~.~> Containing nitrogen |
| 40 | DF | .~.~.~.~> Containing C-CO-CHOH, e.g., benzoin, etc. {1} |
| 42 | DF | .~.~.~.~> Containing C-CO-C(R)(OH) wherein R is organic |
| 43 | DF | .~.~.~.~> Containing C-CO-C(H)(OR) wherein R is organic, e.g., benzoin methyl ether, etc. |
| 44 | DF | .~.~.~.~> Containing C-CO-C(R)(OR) wherein R is organic, e.g., diethoxyacetophenone, etc. |
| 45 | DF | .~.~.~.~> Containing halogen, e.g., chloroacetone, etc. |
| 46 | DF | .~.~.~.~> At least two aryl groups connected directly to same carbonyl carbon, e.g., benzophenone, etc. |