US PATENT SUBCLASS 522 / 145
.~.~.~.~ Chemical reactant has two or more ethylenic groups and contains only carbon and hydrogen

Current as of: June, 1999
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522 /   HD   SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES

*  DD  SYNTHETIC RESINS (Class 520, Subclass 1) {1}
1  DF  .~ COMPOSITIONS TO BE POLYMERIZED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR COMPOSITIONS TO BE MODIFIED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR PROCESSES OF PREPARING OR TREATING A SOLID POLYMER UTILIZING WAVE ENERGY {27}
134  DF  .~.~ Processes of chemically modifying a solid polymer or SICP derived from at least one saturated monomer by treating solid polymer or SICP with a chemical reactant; or compositions therefor {3}
135  DF  .~.~.~ Chemical reactant is ethylenically unsaturated {3}
145.~.~.~.~ Chemical reactant has two or more ethylenic groups and contains only carbon and hydrogen

DEFINITION

Classification: 522/145

Chemical reactant has two or more ethylenic groups and contains only carbon and hydrogen:

(under subclass 135) Subject matter wherein the ethylenic unsaturated reactant contains only carbon and hydrogen atoms and at least two ethylenic groups.