US PATENT SUBCLASS 522 / 12
.~.~.~.~ Contains compound containing keto group not part of a ring and a specified rate-affecting material; or contains a specified rate-affecting material and a nonspecified photoinitiator or photosensitizer

Current as of: June, 1999
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522 /   HD   SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES

*  DD  SYNTHETIC RESINS (Class 520, Subclass 1) {1}
1  DF  .~ COMPOSITIONS TO BE POLYMERIZED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR COMPOSITIONS TO BE MODIFIED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR PROCESSES OF PREPARING OR TREATING A SOLID POLYMER UTILIZING WAVE ENERGY {27}
6  DF  .~.~ Compositions to be polymerized or modified by wave energy wherein said composition contains at least one specified rate-affecting material; or processes of preparing or treating a solid polymer utilizing wave energy in the presence of at least one specified rate-affecting material; e.g., nitrogen containing photosensitizer, oxygen containing photoinitiator, etc. wave energy in order to prepare a cellular product {14}
7  DF  .~.~.~ Contains two or more rate-affecting materials, at least one of which is specified {10}
12.~.~.~.~ Contains compound containing keto group not part of a ring and a specified rate-affecting material; or contains a specified rate-affecting material and a nonspecified photoinitiator or photosensitizer {11}
13  DF  .~.~.~.~.~> Specified rate-affecting material is a peroxide or azo compound
14  DF  .~.~.~.~.~> Specified rate-affecting material is an amide or tertiary amine
15  DF  .~.~.~.~.~> Specified rate-affecting material contains onium group
16  DF  .~.~.~.~.~> Specified rate-affecting material is heterocyclic
17  DF  .~.~.~.~.~> Specified rate-affecting material contains sulfur
18  DF  .~.~.~.~.~> Specified rate-affecting material contains phosphorous, arsenic, antimony or nitrogen atom
19  DF  .~.~.~.~.~> Specified rate-affecting material is an aldehyde or aldehyde derivative
20  DF  .~.~.~.~.~> Specified rate-affecting material is a carboxylic acid or derivative
21  DF  .~.~.~.~.~> Specified rate-affecting material contains C-OH or C-O-C group
22  DF  .~.~.~.~.~> Specified rate-affecting material contains an inorganic compound
23  DF  .~.~.~.~.~> Specified rate-affecting material contains only carbon, hydrogen, or halogen and at least one atom of carbon is bonded to hydrogen or a halogen atom

DEFINITION

Classification: 522/12

Contains compounds containing keto group not part of ring and a specified rate-affecting material; or contains a specified rate-affecting material and a nonspecified photoinitiator or photosensitizer:

(under subclass 7) Subject matter wherein either (a) one rate-affecting material contains a keto group not part of a ring plus a specified rate-affecting material or (b) one specified rate-affecting material plus a rate-affecting material designated merely as a "photoinitiator" or "photosensitizer".

(1) Note. Classification in the subclasses indented hereinunder is based upon the first-appearing specified rate-affecting material.

(2) Note. A material having a keto group as part of a ring may still be proper for this subclass if in fact an additional keto group is present which is not part of a ring, e.g., [figure] [caption]etc.

(3) Note. Ring as used in this subclass includes heterocyclic rings, carbocyclic, or any other ring system.

(4) Note. See Class 520, the Glossary, for a definition of the term "ketone"

SEE OR SEARCH THIS CLASS, SUBCLASS:

8+, for the combination of either two rate-affecting materials both of which contain a keto group not part of ring or one specified rate-affecting material containing a keto group not part of a ring plus a rate-affecting material designated merely as a "photoinitiator" or photosensitizer".

13, for peroxide catalyst plus benzoin ethyl ether catalyst. 21, for the combination of resorcinol monobenzoate plus photoinitiator.

22, for the combination of Mn2[end subscrpt](CO)10 plus [figure]