US PATENT SUBCLASS 438 / FOR 401
.~.~ Si (Silicon) and N (Nitrogen) (437/241)

Current as of: June, 1999
Click HD for Main Headings
Click for All Classes

Internet Version by PATENTEC © 1999      Terms of Use


438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

FOR 385  DF  INCLUDING COATING OR MATERIAL REMOVAL, E.G., ETCHING, GRINDING, ETC. (437/ 225) {9}
FOR 395  DF  .~ Of a dielectric or insulative material (437/235) {4}
FOR 401.~.~ Si (Silicon) and N (Nitrogen) (437/241) {1}
FOR 402  DF  .~.~.~> By chemical reaction with substrate (437/242)

DEFINITION

Classification: 438/FOR.401

Si (Silicon) and N (Nitrogen):

Foreign art collection for processes wherein the

nonconductive substrate is composed of silicon (Si) and nitrogen (N).