US PATENT SUBCLASS 438 / FOR 351
.~.~ Of polysilicon only (437/191)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

FOR 340  DF  MAKING OR ATTACHING ELECTRODE ON OR TO SEMICONDUCTOR, OR SECURING COMPLETED SEMICONDUCTOR TO MOUNTING OR HOUSING (437/180) {13}
FOR 349  DF  .~ Forming plural layered electrode (437/189) {6}
FOR 351.~.~ Of polysilicon only (437/191)

DEFINITION

Classification: 438/FOR.351

Of polysilicon only:

Foreign art collection for processes wherein the contact is composed of multiple layers of polysilicon crystals only.