US PATENT SUBCLASS 438 / FOR 286
.~.~ Heteroepitaxy (437/126)


Current as of: June, 1999
Click HD for Main Headings
Click for All Classes

Internet Version by PATENTEC © 1999      Terms of Use



438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

FOR 149  DF  INCLUDING FORMING A SEMICONDUCTOR JUNCTION (437/15) {7}
FOR 241  DF  .~ Doping during fluid growth of semiconductor material on substrate (437/81) {25}
FOR 286.~.~ Heteroepitaxy (437/126) {7}
FOR 287  DF  .~.~.~> Multi-color light emitting diode (LED) (437/127)
FOR 288  DF  .~.~.~> Graded composition (437/128)
FOR 289  DF  .~.~.~> Forming laser (437/129)
FOR 290  DF  .~.~.~> By liquid phase epitaxy (437/130)
FOR 291  DF  .~.~.~> Si (Silicon on Ge (Germanium) or Ge (Germanium) on Si (Silicon) (437/131)
FOR 292  DF  .~.~.~> Either Si (Silicon) or Ge (Germanium) layered with or on compound formed from Group III and Group V elements (437/132)
FOR 293  DF  .~.~.~> Compound formed from Group III and Group V elements on diverse Group III and Group V including substituted Group III and Group V compounds (437/133)


DEFINITION

Classification: 438/FOR.286

Heteroepitaxy:

Foreign art collection for processes for growing a single crystal material on a different single crystal material.