US PATENT SUBCLASS 438 / FOR 242
.~.~ Including heat to anneal (437/82)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

FOR 149  DF  INCLUDING FORMING A SEMICONDUCTOR JUNCTION (437/15) {7}
FOR 241  DF  .~ Doping during fluid growth of semiconductor material on substrate (437/81) {25}
FOR 242.~.~ Including heat to anneal (437/82)

DEFINITION

Classification: 438/FOR.242

Including heat to anneal:

Foreign art collection for processes providing a increased temperature modification to anneal.