US PATENT SUBCLASS 438 / FOR 153
.~.~ Coherent light beam (437/19)

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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

FOR 149  DF  INCLUDING FORMING A SEMICONDUCTOR JUNCTION (437/15) {7}
FOR 150  DF  .~ Using energy beam to introduce dopant or modify dopant distribution (437/ 16) {5}
FOR 153.~.~ Coherent light beam (437/19)

DEFINITION

Classification: 438/FOR.153

Coherent light beam:

Foreign art collection for a process involving use of coherent light in the range of ultraviolet (UV) to infrared in a pulsed or scanning mode to control defect density of dopant distribution in a doped semiconductor.