US PATENT SUBCLASS 438 / 83
.~.~ Forming point contact


Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

48  DF  MAKING DEVICE OR CIRCUIT RESPONSIVE TO NONELECTRICAL SIGNAL {5}
57  DF  .~ Responsive to electromagnetic radiation {22}
83.~.~ Forming point contact


DEFINITION

Classification: 438/83

Forming point contact:

(under subclass 57) Process for making a device responsive to electromagnetic radiation including forming a potential barrier between an electrode of small contacting or cross-sectional area in touching relationship with a substantially larger area of the semiconductor substrate, thus forming a potential barrier junction at the single point therebetween.