US PATENT SUBCLASS 438 / 734
.~.~ Sequential etching steps on a single layer

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

689  DF  CHEMICAL ETCHING {6}
706  DF  .~ Vapor phase etching (i.e., dry etching) {3}
734.~.~ Sequential etching steps on a single layer

DEFINITION

Classification: 438/734

Sequential etching steps on a single layer:

(under subclass 706) Processes wherein plural etching steps are carried out on a single layer at different times.

(1) Note. Removal of a resist layer which has the sole function of protecting an underlying area from etchant is not considered to be an etching step for this and the indented subclasses.