US PATENT SUBCLASS 438 / 62
.~.~.~ Using running length substrate

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

48  DF  MAKING DEVICE OR CIRCUIT RESPONSIVE TO NONELECTRICAL SIGNAL {5}
57  DF  .~ Responsive to electromagnetic radiation {22}
61  DF  .~.~ Continuous processing {1}
62.~.~.~ Using running length substrate

DEFINITION

Classification: 438/62

Using running length substrate:

(under subclass 61) Process whereby the continuous processing is affected using an elongate substrate of indeterminate length having a semiconductive layer thereon.

SEE OR SEARCH THIS CLASS, SUBCLASS:

484, for a process of depositing amorphous active semiconductor onto a substrate of indeterminate length.

490, for a process of depositing polycrystalline active semiconductor onto a substrate of indeterminate length.