US PATENT SUBCLASS 438 / 529
.~.~.~ Using same conductivity-type dopant

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

510  DF  INTRODUCTION OF CONDUCTIVITY MODIFYING DOPANT INTO SEMICONDUCTIVE MATERIAL {7}
514  DF  .~ Ion implantation of dopant into semiconductor region {12}
527  DF  .~.~ Including multiple implantation steps {2}
529.~.~.~ Using same conductivity-type dopant

DEFINITION

Classification: 438/529

Using same conductivity-type dopant:

(under subclass 527) Process wherein the multiple implantation steps introduce electrically active dopant ions of the same conductivity type into one or more regions of the semiconductor substrate.