US PATENT SUBCLASS 438 / 509
.~.~ Heat treatment

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

478  DF  FORMATION OF SEMICONDUCTIVE ACTIVE REGION ON ANY SUBSTRATE (E.G., FLUID GROWTH, DEPOSITION) {9}
507  DF  .~ Fluid growth from gaseous state combined with subsequent diverse operation {2}
509.~.~ Heat treatment

DEFINITION

Classification: 438/509

Heat treatment:

(under subclass 507) Process wherein the substrate having the deposited semiconductor active region thereon is heat treated following a step of fluid growth of semiconductive material from the gaseous state.