US PATENT SUBCLASS 438 / 504
.~.~ Differential etching

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

478  DF  FORMATION OF SEMICONDUCTIVE ACTIVE REGION ON ANY SUBSTRATE (E.G., FLUID GROWTH, DEPOSITION) {9}
503  DF  .~ Fluid growth from gaseous state combined with preceding diverse operation {2}
504.~.~ Differential etching

DEFINITION

Classification: 438/504

Differential etching:

(under subclass 503) Process wherein the differential etching of the substrate prior to the fluid growth of semiconductive material from the gaseous state is the diverse step.