US PATENT SUBCLASS 438 / 480
.~.~ Including implantation of ion which reacts with semiconductor substrate to form insulating layer

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

478  DF  FORMATION OF SEMICONDUCTIVE ACTIVE REGION ON ANY SUBSTRATE (E.G., FLUID GROWTH, DEPOSITION) {9}
479  DF  .~ On insulating substrate or layer {2}
480.~.~ Including implantation of ion which reacts with semiconductor substrate to form insulating layer

DEFINITION

Classification: 438/480

Including implantation of ion which reacts with semiconductor substrate to form insulating layer:

(under subclass 479) Process for the deposition of a semiconductor layer onto an electrically insulating layer including implanting an ion which reacts with the semiconductive regions of the substrate to form an electrically insulating layer.

SEE OR SEARCH THIS CLASS, SUBCLASS:

766, for a per se process of implanting an ion which reacts with semiconductive regions of the substrate to form an electrical insulator.