US PATENT SUBCLASS 438 / 475
.~.~.~ Hydrogen plasma (i.e., hydrogenization)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

471  DF  GETTERING OF SUBSTRATE {4}
473  DF  .~ By implanting or irradiating {1}
474  DF  .~.~ Ionized radiation (e.g., corpuscular or plasma treatment, etc.) {1}
475.~.~.~ Hydrogen plasma (i.e., hydrogenization)

DEFINITION

Classification: 438/475

Hydrogen plasma (i.e., hydrogenization):

(under subclass 474) Process wherein the radiation is a plasma containing ionized hydrogen (i.e., proton irradiation).