US PATENT SUBCLASS 438 / 473
.~ By implanting or irradiating

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

471  DF  GETTERING OF SUBSTRATE {4}
473.~ By implanting or irradiating {1}
474  DF  .~.~> Ionized radiation (e.g., corpuscular or plasma treatment, etc.) {1}

DEFINITION

Classification: 438/473

By implanting or irradiating:

(under subclass 471) Process wherein a step of implanting or irradiating the semiconductive substrate is utilized to produce a gettering effect.