US PATENT SUBCLASS 438 / 41
.~.~ With epitaxial deposition of semiconductor adjacent mesa
Current as of:
June, 1999
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438 /
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SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS
22
DF
MAKING DEVICE OR CIRCUIT EMISSIVE OF NONELECTRICAL SIGNAL
{12}
39
DF
.~ Mesa formation {2}
41
.~.~ With epitaxial deposition of semiconductor adjacent mesa
DEFINITION
Classification: 438/41
With epitaxial deposition of semiconductor adjacent mesa:
(under subclass 39) Process including a step of epitaxial growth of semiconductor material on the portion of the substrate adjacent the mesa.