US PATENT SUBCLASS 438 / 39
.~ Mesa formation

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

22  DF  MAKING DEVICE OR CIRCUIT EMISSIVE OF NONELECTRICAL SIGNAL {12}
39.~ Mesa formation {2}
40  DF  .~.~> Tapered etching
41  DF  .~.~> With epitaxial deposition of semiconductor adjacent mesa

DEFINITION

Classification: 438/39

Mesa formation:

(under subclass 22) Process having a step of removing material from the semiconductor substrate to form a raised feature relative to the surrounding regions of the substrate.