US PATENT SUBCLASS 438 / 319
.~.~.~ Air isolation (e.g., mesa, etc.)

Current as of: June, 1999
Click HD for Main Headings
Click for All Classes

Internet Version by PATENTEC © 1999      Terms of Use


438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

309  DF  FORMING BIPOLAR TRANSISTOR BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS {25}
312  DF  .~ Having heterojunction {7}
318  DF  .~.~ Including isolation structure {1}
319.~.~.~ Air isolation (e.g., mesa, etc.)

DEFINITION

Classification: 438/319

Air isolation (e.g., mesa, etc.):

(under subclass 318) Process for making a heterojunction bipolar transistor wherein the emitter or collector region of the device is a raised feature with respect to the plane of the substrate.

SEE OR SEARCH THIS CLASS, SUBCLASS:

343, for a process of making a nonheterojunction bipolar device having a mesa or stacked emitter.