US PATENT SUBCLASS 438 / 29
.~ Including integrally formed optical element (e.g., reflective layer, luminescent material, contoured surface, etc.)

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

22  DF  MAKING DEVICE OR CIRCUIT EMISSIVE OF NONELECTRICAL SIGNAL {12}
29.~ Including integrally formed optical element (e.g., reflective layer, luminescent material, contoured surface, etc.) {3}
30  DF  .~.~> Liquid crystal component
31  DF  .~.~> Optical waveguide structure
32  DF  .~.~> Optical grating structure

DEFINITION

Classification: 438/29

Including integrally formed optical element (e.g., reflective layer, luminescent material, contoured surface, etc.):

(under subclass 22) Process for making a semiconductor device wherein the device has combined therewith one or more optical elements to transmit or modify electromagnetic radiation incident from the semiconductor device.