US PATENT SUBCLASS 430 / 287.1
.~.~.~.~ Ethylenic unsaturation within the side chain component


Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

269  DF  IMAGING AFFECTING PHYSICAL PROPERTY OF RADIATION SENSITIVE MATERIAL, OR PRODUCING NONPLANAR OR PRINTING SURFACE - PROCESS, COMPOSITION, OR PRODUCT {17}
270.1  DF  .~ Radiation sensitive composition or product or process of making {5}
281.1  DF  .~.~ Radiation sensitive composition comprising ethylenically unsaturated compound {5}
286.1  DF  .~.~.~ Resin or prepolymer containing ethylenical unsaturation {1}
287.1.~.~.~.~ Ethylenic unsaturation within the side chain component


DEFINITION

Classification: 430/287.1

Ethylenic unsaturation within the side chain component:

(under subclass 286.1) Subject matter wherein the ethylenically unsaturated ingredient is a resin or prepolymer with ethylenic unsaturation in the side chain of the resin or prepolymer.

(1) Note. Prepolymer for this subclass definition excludes monomer compounds having no recurring units.