US PATENT SUBCLASS 430 / 281.1
.~.~ Radiation sensitive composition comprising ethylenically unsaturated compound


Current as of: June, 1999
Click HD for Main Headings
Click for All Classes

Internet Version by PATENTEC © 1999      Terms of Use



430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

269  DF  IMAGING AFFECTING PHYSICAL PROPERTY OF RADIATION SENSITIVE MATERIAL, OR PRODUCING NONPLANAR OR PRINTING SURFACE - PROCESS, COMPOSITION, OR PRODUCT {17}
270.1  DF  .~ Radiation sensitive composition or product or process of making {5}
281.1.~.~ Radiation sensitive composition comprising ethylenically unsaturated compound {5}
282.1  DF  .~.~.~> N-vinylidene
283.1  DF  .~.~.~> Amide {1}
285.1  DF  .~.~.~> Polyester
286.1  DF  .~.~.~> Resin or prepolymer containing ethylenical unsaturation {1}
288.1  DF  .~.~.~> Plural, terminal unsaturation


DEFINITION

Classification: 430/281.1

Radiation sensitive composition comprising ethylenically unsaturated compound:

(under subclass 270.1) Subject matter wherein the radiation sensitive composition includes an ethylenically unsaturated ingredient.