US PATENT SUBCLASS 430 / 270.1
.~ Radiation sensitive composition or product or process of making


Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

269  DF  IMAGING AFFECTING PHYSICAL PROPERTY OF RADIATION SENSITIVE MATERIAL, OR PRODUCING NONPLANAR OR PRINTING SURFACE - PROCESS, COMPOSITION, OR PRODUCT {17}
270.1.~ Radiation sensitive composition or product or process of making {5}
270.11  DF  .~.~> Optical recording nonstructural layered product having a radiation sensitive composition layer claimed or solely disclosed as optically reorderable and optically machine readable {2}
271.1  DF  .~.~> Identified backing or protective layer containing {4}
280.1  DF  .~.~> Radiation sensitive composition comprising oxirane ring containing component
281.1  DF  .~.~> Radiation sensitive composition comprising ethylenically unsaturated compound {5}
289.1  DF  .~.~> Radiation sensitive chromium compound


DEFINITION

Classification: 430/270.1

Radiation sensitive composition or product or process of making:

(under subclass 269) Radiation sensitive composition or product and the process of making the composition or product.