US PATENT SUBCLASS 430 / 286.1
.~.~.~ Resin or prepolymer containing ethylenical unsaturation

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

269  DF  IMAGING AFFECTING PHYSICAL PROPERTY OF RADIATION SENSITIVE MATERIAL, OR PRODUCING NONPLANAR OR PRINTING SURFACE - PROCESS, COMPOSITION, OR PRODUCT {17}
270.1  DF  .~ Radiation sensitive composition or product or process of making {5}
281.1  DF  .~.~ Radiation sensitive composition comprising ethylenically unsaturated compound {5}
286.1.~.~.~ Resin or prepolymer containing ethylenical unsaturation {1}
287.1  DF  .~.~.~.~> Ethylenic unsaturation within the side chain component

DEFINITION

Classification: 430/286.1

Resin or prepolymer containing ethylenical unsaturation:

(under subclass 281.1) Subject matter wherein the ethylenically unsaturated ingredient is a resin or prepolymer with ethylenic unsaturation in the main chain of the resin or prepolymer (see (1) Note in subclass 287.1).