US PATENT SUBCLASS 430 / 197
.~.~.~.~ Polymeric mixture

Current as of: June, 1999
Click HD for Main Headings
Click for All Classes

Internet Version by PATENTEC © 1999      Terms of Use


430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

141  DF  DIAZO REPRODUCTION, PROCESS, COMPOSITION, OR PRODUCT {7}
154  DF  .~ Composition or product which contains radiation sensitive compound having moiety of nitrogen double or triple bonded directly to nitrogen other than chromophore moiety, e.g., triazene containing product, etc., process of making, and composition or product used to finish or develop a diazo reproduction {3}
170  DF  .~.~ Radiation-sensitive composition {4}
194  DF  .~.~.~ Azide containing {3}
197.~.~.~.~ Polymeric mixture

DEFINITION

Classification: 430/197

Polymeric mixture:

(under subclass 194) Compositions wherein the radiation-sensitive azide compound and a polymer are present together in admixture, e.g., an aromatic azide compound and synthetic rubbers such as isoprene.