US PATENT SUBCLASS 430 / 196
.~.~.~.~ And monomeric processing ingredient

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

141  DF  DIAZO REPRODUCTION, PROCESS, COMPOSITION, OR PRODUCT {7}
154  DF  .~ Composition or product which contains radiation sensitive compound having moiety of nitrogen double or triple bonded directly to nitrogen other than chromophore moiety, e.g., triazene containing product, etc., process of making, and composition or product used to finish or develop a diazo reproduction {3}
170  DF  .~.~ Radiation-sensitive composition {4}
194  DF  .~.~.~ Azide containing {3}
196.~.~.~.~ And monomeric processing ingredient

DEFINITION

Classification: 430/196

And monomeric processing ingredient:

(under subclass 194) Compositions which additionally contain a monomeric processing ingredient that finishes or perfects the image.