US PATENT SUBCLASS 427 / 563
.~.~.~ Silicon containing coating material

Current as of: June, 1999
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427 /   HD   COATING PROCESSES

457  DF  DIRECT APPLICATION OF ELECTRICAL, MAGNETIC, WAVE, OR PARTICULATE ENERGY {15}
561  DF  .~ Pretreatment of coating supply or source outside of primary deposition zone or off site {4}
562  DF  .~.~ Electric discharge (e.g., corona, glow discharge, etc.) {2}
563.~.~.~ Silicon containing coating material

DEFINITION

Classification: 427/563

Silicon containing coating material:

(under subclass 562) Processes wherein coating material applied to the substrate contains silicon.

SEE OR SEARCH CLASS

438, Semiconductor Device Manufacturing: Process, particularly

788+, and 792+ for deposition of silicon oxide or silicon nitride, respectively, on a semiconductor substrate utilizing electromagnetic or wave energy.