US PATENT SUBCLASS 427 / 561
.~ Pretreatment of coating supply or source outside of primary deposition zone or off site

Current as of: June, 1999
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427 /   HD   COATING PROCESSES

457  DF  DIRECT APPLICATION OF ELECTRICAL, MAGNETIC, WAVE, OR PARTICULATE ENERGY {15}
561.~ Pretreatment of coating supply or source outside of primary deposition zone or off site {4}
562  DF  .~.~> Electric discharge (e.g., corona, glow discharge, etc.) {2}
565  DF  .~.~> Sonic or ultrasonic (e.g., vibratory energy, etc.)
566  DF  .~.~> Electron irradiation (e.g., e-beam evaporation, etc.) {1}
568  DF  .~.~> Silicon containing coating supply or source

DEFINITION

Classification: 427/561

Pretreatment of coating supply or source outside of primary deposition zone or off site:

(under subclass 457) Processes wherein a coating material supply which is offsite or outside of the primary deposition region, zone, or chamber is treated with electrical, magnetic, electromagnetic, or wave energy and subsequently directed or reflected to the substrate to which it is applied.

(1) Note. Included herein are processes of producing a vapor for use in vapor deposition processes.

(2) Note. Processes utilizing plural chambers, shutters, shields, or noncontiguous masks and some guides or separators are used to direct the pretreated coating supply found in this subclass.