US PATENT SUBCLASS 427 / 534
.~.~.~ Cleaning or removing part of substrate (e.g., etching with plasma, glow discharge, etc.)

Current as of: June, 1999
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427 /   HD   COATING PROCESSES

457  DF  DIRECT APPLICATION OF ELECTRICAL, MAGNETIC, WAVE, OR PARTICULATE ENERGY {15}
532  DF  .~ Pretreatment of substrate or post-treatment of coated substrate {9}
533  DF  .~.~ Ionized gas utilized (e.g., electrically powered source, corona discharge, plasma, glow discharge, etc.) {2}
534.~.~.~ Cleaning or removing part of substrate (e.g., etching with plasma, glow discharge, etc.)

DEFINITION

Classification: 427/534

Cleaning or removing part of substrate (e.g., etching with plasma, glow discharge, etc.):

(under subclass 533) Processes wherein, prior to the coating, etching influenced by electrical, magnetic, electromagnetic, or wave energy, is utilized to clean or remove part of the substrate.

(1) Note. Plasma, glow discharge, and electron beam etching are some of the processes used to clean that are found here.

(2) Note. In processes involving plural coating steps wherein electrical, magnetic, electromagnetic, or wave energy etching is used to clean a previously deposited coating with the intent to perfect a subsequent deposited coating will be considered proper for this class (427).

SEE OR SEARCH CLASS

216, Etching a Substrate: Processes, especially

63+, for posttreatment etching utilizing high energy techniques. Pretreatment etching of a substrate utilizing electric, electromagnetic, magnetic, or wave energy is proper for Class 427.