US PATENT SUBCLASS 427 / 532
.~ Pretreatment of substrate or post-treatment of coated substrate


Current as of: June, 1999
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427 /   HD   COATING PROCESSES

457  DF  DIRECT APPLICATION OF ELECTRICAL, MAGNETIC, WAVE, OR PARTICULATE ENERGY {15}
532.~ Pretreatment of substrate or post-treatment of coated substrate {9}
533  DF  .~.~> Ionized gas utilized (e.g., electrically powered source, corona discharge, plasma, glow discharge, etc.) {2}
540  DF  .~.~> Arc or electrical discharge
541  DF  .~.~> Drying {1}
543  DF  .~.~> Induction or dielectric heating {1}
545  DF  .~.~> Resistance heating {1}
547  DF  .~.~> Magnetic field or force utilized {2}
551  DF  .~.~> High energy electromagnetic radiation or high energy particles utilized (e.g., gamma ray, X-ray, atomic particle, i.e., alpha ray, beta ray, high energy electron, etc.) {1}
553  DF  .~.~> Low energy electromagnetic radiation (e.g., microwave, radio wave, IR, UV, visible, actinic, laser, etc.) {2}
560  DF  .~.~> Sonic or ultrasonic (e.g., cleaning or removing material from substrate, etc.)


DEFINITION

Classification: 427/532

Pretreatment of substrate or post-treatment of coated substrate:

(under subclass 457) Processes wherein (1) prior to a coating a substrate is chemically or physically modified or (2) after a coating is applied there is modification of the chemical or physical characteristics of the coated substrate utilizing electrical, magnetic, electromagnetic, or wave energy.

SEE OR SEARCH CLASS

65, Glass Manufacturing, for processes involving coating glass plus subsequent treatment thereof (e.g., including patents claiming the step of coating a glass substrate and reacting the coating with a constituent of the glass substrate).