US PATENT SUBCLASS 427 / 533
.~.~ Ionized gas utilized (e.g., electrically powered source, corona discharge, plasma, glow discharge, etc.)

Current as of: June, 1999
Click HD for Main Headings
Click for All Classes

Internet Version by PATENTEC © 1999      Terms of Use


427 /   HD   COATING PROCESSES

457  DF  DIRECT APPLICATION OF ELECTRICAL, MAGNETIC, WAVE, OR PARTICULATE ENERGY {15}
532  DF  .~ Pretreatment of substrate or post-treatment of coated substrate {9}
533.~.~ Ionized gas utilized (e.g., electrically powered source, corona discharge, plasma, glow discharge, etc.) {2}
534  DF  .~.~.~> Cleaning or removing part of substrate (e.g., etching with plasma, glow discharge, etc.)
535  DF  .~.~.~> Plasma (e.g., cold plasma, corona, glow discharge, etc.) {2}

DEFINITION

Classification: 427/533

Ionized gas utilized (e.g., electrically powered source, corona discharge, plasma, glow discharge, etc.):

(under subclass 532) Processes wherein an energetic (charged) gaseous medium is utilized in the pretreatment of a substrate or the post-treatment of a substrate.

(1) Note. Alpha rays (particles) are identical to the helium atom, and for classification purposes will not be considered as an ionized gas since, they are not in a

naturally occurring ionization state under any normal earth conditions, except in nuclear processes.