US PATENT SUBCLASS 378 / 71
.~.~ Diffractometry

Current as of: June, 1999
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378 /   HD   X-RAY OR GAMMA RAY SYSTEMS OR DEVICES

1  DF  SPECIFIC APPLICATION {14}
70  DF  .~ Diffraction, reflection, or scattering analysis {3}
71.~.~ Diffractometry {3}
72  DF  .~.~.~> Stress analysis
73  DF  .~.~.~> Crystalography {5}
79  DF  .~.~.~> Analyte support {2}

DEFINITION

Classification: 378/71

Diffractometry:

(under subclass 70) Subject matter providing for the generation and examination or determination of at least part of the characteristic X-ray diffraction pattern of an analyte.

(1) Note. Devices under subclass 82 employ diffraction elements such as crystals and gratings which spatially disperse X-rays according to their energy. These elements are not objects or examination as in this subclass but rather are tools for examining something else since their diffraction patterns are known.