US PATENT SUBCLASS 378 / 70
.~ Diffraction, reflection, or scattering analysis


Current as of: June, 1999
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378 /   HD   X-RAY OR GAMMA RAY SYSTEMS OR DEVICES

1  DF  SPECIFIC APPLICATION {14}
70.~ Diffraction, reflection, or scattering analysis {3}
71  DF  .~.~> Diffractometry {3}
82  DF  .~.~> Spatial energy dispersion {2}
86  DF  .~.~> Scatter analysis {3}


DEFINITION

Classification: 378/70

Diffraction, reflection, or scattering analysis:

(under subclass 1) Subject matter including the measurement or sensing of X-rays, the direction of which have been modified by interaction with an object under examination.

(1) Note. Although not specifically included within each of the following definitions, diffraction, reflection, or scattering systems usually include, (a) source of X-rays or gamma rays, (b) a diffracting, reflecting, or scattering object, (c) an object holder or positioning means, and (d) a detector of diffracted, reflected, or scattered X-rays.

SEE OR SEARCH CLASS

209, Classifying, Separating, and Assorting Solids, appropriate subclasses, especially

589, for radiant energy type automatic assorting.