US PATENT SUBCLASS 378 / 72
.~.~.~ Stress analysis

Current as of: June, 1999
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378 /   HD   X-RAY OR GAMMA RAY SYSTEMS OR DEVICES

1  DF  SPECIFIC APPLICATION {14}
70  DF  .~ Diffraction, reflection, or scattering analysis {3}
71  DF  .~.~ Diffractometry {3}
72.~.~.~ Stress analysis

DEFINITION

Classification: 378/72

Stress analysis:

(under subclass 71) Subject matter including detecting the presence or measuring the extent of stress within an analyte by analyzing the manner in which its X-ray diffraction pattern is modified when the X-rays are incident on a stressed area.