US PATENT SUBCLASS 216 / 95
.~ Substrate is multilayered


Current as of: June, 1999
Click HD for Main Headings
Click for All Classes

Internet Version by PATENTEC © 1999      Terms of Use



216 /   HD   ETCHING A SUBSTRATE: PROCESSES

83  DF  NONGASEOUS PHASE ETCHING OF SUBSTRATE {9}
95.~ Substrate is multilayered


DEFINITION

Classification: 216/95

Substrate is multilayered:

(under subclass 83) Process wherein the substrate is plural layered.

(1) Note. The presence of a resist layer whose sole function is to protect some part of the substrate from etchant will not be considered sufficient to make the substrate plural-layered if it is to be removed.