US PATENT SUBCLASS 216 / 53
.~ Nongaseous phase etching

Current as of: June, 1999
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216 /   HD   ETCHING A SUBSTRATE: PROCESSES

52  DF  MECHANICALLY SHAPING, DEFORMING, OR ABRADING OF SUBSTRATE {1}
53.~ Nongaseous phase etching

DEFINITION

Classification: 216/53

Nongaseous phase etching:

(under subclass 52) Process wherein the etchant is employed in a nongaseous phase.

(1) Note. Most of the patents herein are to the use of a liquid etchant. See the Glossary for a definition of the term Liquid.