US PATENT SUBCLASS 216 / 52
MECHANICALLY SHAPING, DEFORMING, OR ABRADING OF SUBSTRATE


Current as of: June, 1999
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216 /   HD   ETCHING A SUBSTRATE: PROCESSES

52MECHANICALLY SHAPING, DEFORMING, OR ABRADING OF SUBSTRATE {1}
53  DF  .~> Nongaseous phase etching


DEFINITION

Classification: 216/52

MECHANICALLY SHAPING, DEFORMING, OR ABRADING OF SUBSTRATE:

(under the class definition) Process including a step of subjecting a substrate to physical force of sufficient magnitude to cause permanent distortion thereof or removal of material therefrom.

(1) Note. Included herein, e.g., are embossing, bending, abrading, cutting, breaking, etc.

(2) Note. For the line between this class and the metal working classes wherein a step of metal working is included, see Lines With Other Classes And Within This Class in this class (216).