(under subclass 41) Process of exposing the etch resist to nonimaging radiation, e.g., U.V. light, laser beam, etc.
SEE OR SEARCH THIS CLASS, SUBCLASS:
62, for altering of the etchability of a substrate by irradiation, ion implantation, alloying, diffusing, or chemically reacting the substrate during gas phase etching.
63+, for gas phase etching with application of energy to the substrate being etched, e.g., ultrasonic, substrate heating, radiation, plasma, ion beam, etc.
87, for altering of the etchability of a substrate during liquid phase etching by treatment with high energy radiation,
alloying, diffusion, or chemically reacting.
94, for liquid phase etching with high energy irradiation, e.g., laser, e-beam, or ion beam, etc.
SEE OR SEARCH CLASS 430, Radiation Imagery Chemistry: Process, Composition, or Product Thereof, for the production of an image formed by use of radiation or light combined with etching.
